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Abstract

Disclosed is a resist pattern prediction device, which includes an optical proximity correction module for generating both an optical proximity correction and a non-optical proximity correction. The optical proximity correction module generates an aerial image by performing an optical proximity correction based on a mask image. The module also generates a resist image by performing a non-optical proximity correction on the mask image and the aerial image. The resist pattern prediction device also includes a pattern prediction module that predicts information with respect to a resist pattern based on the resist image. The non-optical proximity correction includes performing a convolution operation on the aerial image using a Volterra kernel based on a coefficient of a quadratic term of a Volterra series.

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First Claim