Importance

Loading Importance Indicators...

Abstract

Provided are an optical proximity correction (OPC) method and a mask manufacturing method including the OPC method for implementing a simulation contour more stiffly to ensure a processing margin. The OPC method includes receiving a design layout for a target pattern, obtaining an OPC pattern by performing first OPC on the design layout, extracting a transition area as an area having a width that changes from a first width to a second width, which is less than the first width, from the target pattern, obtaining a simulation contour for the transition area, calculating at least one of a correction length and a correction angle based on the simulation contour, obtaining a first OPC pattern for the transition area based on at least one of the correction length and the correction angle, and obtaining a final OPC pattern by merging the first OPC pattern with the OPC pattern.

Loading the Abstract Image...

First Claim