REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WITH CONDUCTIVE FILM
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United States of America
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Issued Date -
Mar 6, 2025
app pub date -
Nov 15, 2024
filing date -
Nov 15, 2024
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Abstract
A reflective mask blank for EUV lithography, includes: a substrate; a conductive film disposed on or above a back surface of the substrate; a reflective layer disposed on or above a front surface of the substrate, the reflective layer reflecting EUV light; and an absorption layer disposed on or above the reflective layer, the absorption layer absorbing the EUV light.
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