SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICONDUCTING WAFERS
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United States of America
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Mar 6, 2025
app pub date -
Aug 27, 2024
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Aug 27, 2024
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Abstract
Systems and methods are described for generating organic solvent scan solutions and calibration standards inline for semiconductor wafer analysis. A method embodiment includes, but is not limited to, drawing, via a pump system, a first organic solvent from a first organic chemical source; drawing, via the pump system, a second organic solvent from a second organic chemical source; mixing, inline, the first organic solvent and the second organic solvent to form an organic scan solution; and introducing the organic scan solution to a scan nozzle for introduction to one or more surfaces of a semiconducting wafer to remove one or more organic contaminants from the semiconducting wafer.
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