PHOTONIC DEVICE FORMED USING SELF-ALIGNED PROCESSES

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250063845A1
SERIAL NO

18512686

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Abstract

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A photonic device includes a substrate, a P-type doped component disposed over the substrate, an N-type doped component disposed over the substrate, an optical absorption layer disposed over the substrate, and a charging layer disposed over the substrate. The optical absorption layer is disposed between the P-type doped component and the N-type doped component. The optical absorption layer and the substrate have different material compositions. A charging layer is disposed between the P-type doped component and the N-type doped component. The charging layer has a first side surface that is substantially linear. The first side surface is in direct contact with the optical absorption layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lu, Hau-Yan Hsinchu City, TW 65 246
Peng, Chun-Yen Hsinchu, TW 39 40
Tsui, YingKit Felix Cupertino, US 48 6

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