REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
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United States of America
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Feb 20, 2025
app pub date -
Aug 2, 2024
filing date -
Aug 2, 2024
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Abstract
A fine and preferable pattern of an absorption film can be formed from the absorption film that can be patterned by dry etching using a gas containing oxygen (O) by a reflective mask blank including a substrate, a multilayer reflection film that is formed on one main surface of the substrate, and reflects exposure light, an absorption film that is formed on the multilayer reflection film, and absorbs the exposure light, and an etching mask film containing niobium (Nb) on the absorption film.
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