REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
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United States of America
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Issued Date -
Feb 20, 2025
app pub date -
Aug 2, 2024
filing date -
Aug 2, 2024
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Abstract
As a reflective mask blank that includes a protection film containing ruthenium (Ru), a reflective mask blank in which the protection film is hard to be damaged and can be suppressed decrease of the thickness is provided by a reflective mask blank including a substrate, a multilayer reflection film, a protection film, an absorption film, and an etching prevention film that contains niobium (Nb) and is free of ruthenium (Ru) between the protection film and the absorption film.
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