ASYMMETRIC JUNCTIONLESS FIN FIELD EFFECT TRANSISTORS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250056831A1
SERIAL NO

18230977

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present disclosure relates to semiconductor structures and, more particularly, to asymmetric junctionless fin field effect transistor (FINFET) structures and methods of manufacture. The structure includes: a nanowire fin comprising a first width adjacent to a source region and a second width adjacent to a drain region, the first width and the second width being different dimensions; and a gate structure over the nanowire fin, the gate structure spanning over the first width and the second width and being between the source region and the drain region.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES SINGAPORE PTE LTDSINGAPORE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
QUEK, Kiok Boone Elgin Singapore, SG 80 357
TAN, Shyue Seng Singapore, SG 136 117
THIRUNAVUKKARASU, Vasanthan TAMIL NADU, IN 1 0
TOH, Eng Huat Singapore, SG 256 1730

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