PRODUCTION METHOD FOR NITRIDE CRYSTAL SUBSTRATE, AND PEELED INTERMEDIATE

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United States of America

APP PUB NO 20250054754A1
SERIAL NO

18794616

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Abstract

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To stably grow a regrowth layer. A production method for a nitride crystal substrate includes: (a) preparing a base substrate; (b) forming an intermediate layer including n-type group III nitride crystal, above the base substrate; (c) forming a cover layer on the intermediate layer, the cover layer including group III nitride crystal having a carrier concentration lower than a carrier concentration of the intermediate layer; (d) making the intermediate layer porous through dislocations in the cover layer by performing an electrochemical process, while maintaining a surface condition of the cover layer; (e) epitaxially growing a regrowth layer comprising group III nitride crystal, on the cover layer; and (f) peeling off the regrowth layer from the base substrate by using at least a portion of the intermediate layer made porous as a boundary.

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUJIKURA, Hajime Hitachi-shi, JP 58 264
KONNO, Taichiro Hitachi-shi, JP 21 207
YOKOYAMA, Masafumi Hitachi-shi, JP 29 208

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