COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKELETON

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250053088A1
SERIAL NO

18718710

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Abstract

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A composition for forming a resist underlayer film, containing a solvent and a polymer including a structure represented by formula (A) below.

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Patent Owner(s)

  • NISSAN CHEMICAL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HIROHARA, Tomotada Toyama-shi, JP 11 1
TAMURA, Mamoru Toyama-shi, JP 45 230

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