GAS BASED FLOW SENSOR
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Feb 13, 2025
app pub date -
Dec 16, 2022
filing date -
Dec 16, 2022
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
An apparatus and method for metered continuous volumetric dispensing of a liquid fluid or metered dispensing of drop volumes. The apparatus includes a pressure control unit and a gas supply. The pressure control unit includes an input fluidically coupled with the gas supply and an output fluidically coupled with an inlet port of a container. The pressure control unit further includes a first restriction fluidically arranged between the input and the output and a first differential pressure sensor for measuring a pressure difference over the first restriction and the output. The pressure control unit further includes a bypass line with a bypass valve, configured to be open or to be closed, having a first end connected to the input and a second end connected to the output. The bypass line provides a direct fluidic connection between the input and the output, when the bypass valve is open.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully