SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD
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United States of America
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Issued Date -
Feb 13, 2025
app pub date -
Jul 30, 2024
filing date -
Jul 30, 2024
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Abstract
A substrate-processing apparatus includes a process chamber configured to process a plurality of substrates; a rotation table that is disposed in an interior of the process chamber so as to be rotatable and at which the substrates are to be placed at positions that are away in a radial direction of the rotation table from a center of rotation of the rotation table; a supply member configured to supply gas to the substrates placed on the rotation table; and a raising and lowering mechanism configured to raise and lower the supply member relative to the rotation table.
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