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Abstract

An optical component (100, 200) for a lithography apparatus (1) includes an optical element (102, 202), produced from a first material (G₁₀₂) and having an optically effective surface (106, 206); and a carrying element (104, 204), produced from a second material (G₁₀₄) and carrying the optical element (102, 202). The second material (G₁₀₄) differs from the first material (G₁₀₂) and a ratio of the densities of the first and second materials (G₁₀₂, G₁₀₄) deviates from 1 by less than 20%, preferably by less than 10% or even less than 5%. The optical element and the carrying element each have principal extension planes (H₁₀₂, H₂₀₂, H₁₀₄, H₂₀₄) having maximum extents. The maximum extent (D₁₀₂, A₂₀₂) of the optical element (102, 202) is less than 90%, preferably less than 80% or even less than 75% of the maximum extent (A₁₀₄, D₂₀₄) of the carrying element.

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First Claim