MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIER ELEMENT FOR USE IN A MASK INSPECTION DEVICE
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United States of America
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Issued Date -
Feb 6, 2025
app pub date -
Jul 17, 2024
filing date -
Jul 17, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is a mask inspection device for photomasks of EUV lithography. The mask inspection device comprises here a receiving device for a photomask, a light source for illuminating the photomask with an illumination beam, and a detection unit for recording at least regions of the photomask. Furthermore, the mask inspection device comprises at least one beam-shaping element for adapting the illumination beam and at least one stop in the light path between the photomask and the detection unit. The at least one beam-shaping element and the at least one stop are arranged in a fixed spatial relationship to one another on a common carrier element. Also disclosed is the corresponding carrier element.
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