METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD FOR METAL PLATES, VAPOR DEPOSITION MASK, PRODUCTION METHOD FOR VAPOR DEPOSITION MASK, AND VAPOR DEPOSITION MASK DEVICE COMPRISING VAPOR DEPOSITION MASK
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Feb 6, 2025
app pub date -
Oct 17, 2024
filing date -
Oct 17, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 μm. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 μm2 to 50 μm2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully