COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

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United States of America

APP PUB NO 20250036027A1
SERIAL NO

18687019

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Abstract

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A composition for forming a resist underlayer film, the composition including: a polymer containing a unit structure (A) represented by the following formula (1); and a solvent:

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Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL CORPORATION5-1 NIHONBASHI 2-CHOME CHUO-KU TOKYO 103-6119

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IGATA, Kosuke Toyama-shi, JP 2 0
SHIMIZU, Shou Toyama-shi, JP 13 3
TAMURA, Mamoru Toyama-shi, JP 45 230

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