IMAGEABLE COMPOSITION FOR PHOTOSENSITIVE NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE, AND PLATEMAKING METHOD THEREFOR

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United States of America

APP PUB NO 20250036026A1
SERIAL NO

18704448

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Abstract

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Provided is an imageable composition for a photosensitive negative-working lithographic printing plate, and a platemaking method therefor. The imageable composition includes the following components in parts by mass: 25-65 parts of a free radical polymerizable compound, 0.5-25 parts of a photoinitiator, 10-60 parts of a binder, and 1-20 parts of a development accelerator. The platemaking method may comprise coating a substrate, which may have a hydrophilic surface or a hydrophilic layer, with an imageable composition to obtain a photosensitive negative-working lithographic printing plate precursor. The method may additionally include exposing the lithographic printing plate precursor by using laser light and according to a required image, so as to form an exposed region and an unexposed region. Further the method may include removing the unexposed region from the exposed printing plate precursor by means of a development process, so as to obtain a required lithographic printing plate.

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Patent Owner(s)

Patent OwnerAddress
ZHEJIANG KONITA NEW MATERIALS CO LTDNO 929 AIRPORT AVENUE WENZHOU ZHEJIANG 325013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Shiwang Wenzhou, CN 1 0
GAO, Miao Wenzhou, CN 4 3
JIN, Jianchen Wenzhou, CN 1 0
MA, Xianyao Wenzhou, CN 2 0
PAN, Feng Wenzhou, CN 283 3799
TAO, Ting Fort Collins, US 53 236
WENG, Yinqiao Wenzhou, CN 2 0
XU, Nengping Wenzhou, CN 3 0
YING, Zuoting Wenzhou, CN 3 0

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