OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING METHOD COMPRISING OPC METHOD

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United States of America

APP PUB NO 20250036022A1
SERIAL NO

18632558

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Abstract

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Provided is an optical proximity correction (OPC) method including receiving a design layout for a target pattern to be formed on a substrate, obtaining a first OPC pattern by performing a baseline OPC on the design layout, and obtaining a second OPC pattern by curving the first OPC pattern.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Bongkeun Suwon-si, KR 10 38
Kim, Wooseok Suwon-si, KR 34 48
Lee, Sanghwa Suwon-si, KR 21 89
Woo, Sanghwa Suwon-si, KR 1 0

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