REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING REFLECTORS, AND METHODS OF DEPOSITING MATERIAL LAYERS IN SEMICONDUCTOR PROCESSING SYSTEMS USING REFLECTORS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250034714A1
SERIAL NO

18784060

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reflector includes a reflector body having a slotted surface, a planar surface, and an ellipsoidal surface. The planar surface is opposite the slotted surface and is separated from the slotted surface by a thickness of the reflector body. The ellipsoidal surface is offset from the planar surface, is opposite the slotted surface and separated from the slotted surface by the thickness of the reflector body and spans the slotted surface of the reflector body. The ellipsoidal surface defines an elliptical profile that is orthogonal relative to the planar surface to concentrate heat flux at a distal focus of the elliptical profile using electromagnetic radiation reflected by the ellipsoidal surface of the reflector body. Semiconductor processing systems and material layer deposition methods are also described.

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ASM IP HOLDING B VALMERE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chitale, Aniket Phoenix, US 4 7
Demos, Alexandros Scottsdale, US 37 2300
Gao, Fan Chandler, US 32 34
Gao, Peipei Chandler, US 18 1260
Jotheeswaran, Bubesh Babu Gilbert, US 8 716
Kajbafvala, Amir Chandler, US 22 492
Lin, Xing Chandler, US 79 3508
Miskin, Caleb Mesa, US 30 262
Murali, Arun Tempe, US 12 42
Patil, Kishor Chandler, US 6 7
Suarez, Emesto Scottsdale, US 1 0
Wang, Wentao Chandler, US 145 1713

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