SUBSTRATE PROCESSING APPARATUS
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United States of America
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Issued Date -
Jan 30, 2025
app pub date -
Sep 2, 2022
filing date -
Sep 2, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
The present inventive concept relates to a substrate processing apparatus comprising: a chamber; a substrate support part which supports at least one substrate in the chamber; a lower plate which is disposed above the substrate support part; and an upper plate which is disposed above the lower plate, wherein: the upper plate includes a first spray hole which provides a first gas and a second spray hole which provides a second gas; and the lower plate includes a first opening which is disposed under the first spray hole so as to allow the first gas provided from the first spray hole to pass therethrough and a second opening which is disposed under the second spray hole so as to allow the second gas provided from the second spray hole to pass therethrough.
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