DIGITAL EXPOSURE SYSTEM

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United States of America Patent

APP PUB NO 20250028247A1
SERIAL NO

18714640

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A digital exposure system according to an exemplary embodiment of the present invention includes a light source that radiates light onto a substrate, a digital mirror device that forms a two-dimensional pattern image by selectively transmitting light emitted from the light source, an optical system that modulates the two-dimensional pattern image into a one-dimensional pattern image, and a substrate scanner that adjusts the position of the substrate to continuously project the one-dimensional pattern image onto a photosensitive layer on the substrate for scan exposure, and the two-dimensional pattern image has a uniform image in a direction parallel with a scan direction for the substrate and has an image of a target pattern in a direction perpendicular to the scan direction for the substrate.

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Patent Owner(s)

Patent OwnerAddress
KOREA INSTITUTE OF MACHINERY & MATERIALSYOUSEONG-KU DAEJEON-CITY 305-343

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Won Seok Daejeon, KR 28 70
CHO, Hyunmin Daejeon, KR 56 486
KIM, Gee Hong Daejeon, KR 5 91
LEE, Won-Sup Daejeon, KR 8 25
LIM, Hyung Jun Daejeon, KR 32 62

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