POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
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United States of America Patent
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Jan 23, 2025
app pub date -
Nov 15, 2022
filing date -
Nov 15, 2022
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Abstract
A positive working chemically amplified photosensitive composition comprising: Component a) at least one random copolymer, having structure (A), component b) at least one acrylic polymer component of structure (B) comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7); component c) at least one Novolak polymer; component d) at least one photoacid generator (PAG); component c) at least one base additive; component f) at least one heterocyclic thiol compound; and component g) an organic spin casting solvent.
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