HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

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United States of America Patent

APP PUB NO 20250028236A1
SERIAL NO

18678090

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using the hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent,

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG SDI CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHUNG, Jooyoung Suwon-si, KR 2 0
JEONG, Seulgi Suwon-si, KR 9 13
KIM, Seunghyun Suwon-si, KR 67 289
NAM, Younhee Suwon-si, KR 7 13
PARK, Sangchol Suwon-si, KR 3 0
PARK, Yushin Suwon-si, KR 12 2
SO, Minji Suwon-si, KR 4 0

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