PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURING SAME

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United States of America Patent

APP PUB NO 20250028234A1
SERIAL NO

18715438

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Abstract

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Disclosed are: a pellicle for EUV lithography, which simultaneously satisfies the high transmittance and mechanical strength of crystalline silicon and can be manufactured in a large area, and a method for manufacturing the same.

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Patent Owner(s)

Patent OwnerAddress
INFOVION INC83 BUIL-RO 815BEON-GIL BUCHEON-SI 14665

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Yong Hwan Gyeonggi-do, KR 228 375

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