CONTINUOUS CLEANING SYSTEM FOR HALOGEN SALTS

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United States of America Patent

APP PUB NO 20250026656A1
SERIAL NO

18713741

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Processes and devices for reducing impurities in halogen salts, where the halogen salt is brought into contact with an active metal. The halogen salts purified in this way are suitable for use as high-temperature storage materials in thermal power plants and for industrial process heat, or as electrolytes in batteries.

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Patent Owner(s)

Patent OwnerAddress
DEUTSCHES ZENTRUM FUR LUFT- UND RAUMFAHRT E VKÖNIGSWINTERER STR 522-524 BONN 53227

International Classification(s)

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  • 2022 Application Filing Year
  • C01F Class
  • 213 Applications Filed
  • 54 Patents Issued To-Date
  • 25.36 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BAUER, Thomas Köln, DE 142 1089
DING, Wenjin Köln, DE 5 1
GONG, Qing Köln, DE 137 2449

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges90005101520253035404550556065707580859095

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