PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
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United States of America
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Issued Date -
Jan 16, 2025
app pub date -
Oct 1, 2024
filing date -
Oct 1, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask includes a plurality of main patterns, a plurality of first sub-resolution assist feature patterns and a plurality of second sub-resolution assist feature patterns. The first sub-resolution assist feature patterns are located aside the main patterns. The second sub-resolution assist feature patterns are disposed between and connected to adjacent two of the first sub-resolution assist feature patterns.
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