SURFACE PREPARATION FOR ELECTROLYTIC INORGANIC FINISHES
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United States of America
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Issued Date -
Jan 16, 2025
app pub date -
Mar 28, 2024
filing date -
Mar 28, 2024
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Abstract
The present disclosure relates to substrate surface treatment methods and compositions. In at least one aspect, a method includes degreasing a metal substrate; performing a first alkaline cleaning on the metal substrate; etching the metal substrate by electropolishing techniques or with an alkaline etchant solution to form an etched metal substrate, wherein the etched metal substrate comprises an average surface roughness (Ra) of about 8 μin (0.2 μm) to about 16 μin (0.4 μm); deoxidizing the etched metal substrate to form a processed metal substrate; performing alkaline cleaning on the processed metal substrate; optionally performing etch-cleaning and deoxidizing if needed to remove oxides and depositing a coating onto the processed metal substrate to form a coated metal substrate.
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