RELIEF PRECURSORS WITH ENHANCED STABILITY

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250019520A1
SERIAL NO

18762126

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Abstract

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Relief precursors with an enhanced capacity to be developed into high performing relief structures, more in particular high quality relief structures such as printing plates. A photosensitive composition (PC) for forming a photosensitive layer of a relief precursor (RP), comprising particular stabilizers and binders. By including the stabilizer and binder as described herein the stability of the melt of the photosensitive composition during production, e.g. production by extrusion, can be enhanced significantly. Such enhanced stability could be achieved without or with minimal undesired impact on the resulting printing performance and/or imaging characteristics of the reliefs formed by developing the relief precursors.

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Patent Owner(s)

Patent OwnerAddress
XSYS GERMANY GMBHINDUSTRIESTRASSE 1 WILLSTÄTT 77731

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dannecker, Patrick-Kurt Willstatt, DE 2 0
Schlegel, Isabel Willstatt, DE 3 0

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