PROCESS CHAMBER GAS FLOW IMPROVEMENT

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250018415A1
SERIAL NO

18630408

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process chamber is provided including: a chamber body enclosing an interior volume; a first substrate support and a second substrate support each positioned in the interior volume, the first substrate support positioned over the second substrate support; a barrier positioned between the first substrate support and the second substrate support, the interior volume including a first portion above the barrier and a second portion below the barrier; a first gas inlet configured to provide gas to the first portion of the interior volume; and a recirculation passageway having a first port connected to the first portion of the interior volume and a second port connected to the second portion of the interior volume.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SANCHEZ, Errol Antonio C Tracy, US 110 6300
ZHU, Zuoming Sunnyvale, US 43 1810

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