PROCESS CHAMBER GAS FLOW IMPROVEMENT
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United States of America
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Issued Date -
Jan 16, 2025
app pub date -
Apr 9, 2024
filing date -
Apr 9, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
A process chamber is provided including: a chamber body enclosing an interior volume; a first substrate support and a second substrate support each positioned in the interior volume, the first substrate support positioned over the second substrate support; a barrier positioned between the first substrate support and the second substrate support, the interior volume including a first portion above the barrier and a second portion below the barrier; a first gas inlet configured to provide gas to the first portion of the interior volume; and a recirculation passageway having a first port connected to the first portion of the interior volume and a second port connected to the second portion of the interior volume.
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