ATOMIC LAYER DEPOSITION METHODS FOR MAKING OMNIDIRECTIONAL STRUCTURAL COLOR MULTILAYER STRUCTURES
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United States of America
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Jan 9, 2025
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Jul 7, 2023
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Jul 7, 2023
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Abstract
A method of forming a multilayer structure that reflects an omnidirectional structural color by atomic layer deposition (ALD) includes introducing at least one reflective core particle into a reaction chamber and depositing a conformal dielectric layer encapsulating the at least one reflective core particle in a dielectric-layer ALD cycle. Subsequently, a conformal barrier layer encapsulating the conformal dielectric layer is deposited in a barrier-layer ALD cycle, and a conformal absorber layer encapsulating the conformal barrier layer is deposited in an absorber-layer ALD cycle.
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