METAL ETCHING WITH REDUCED TILT ANGLE
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United States of America
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Issued Date -
Dec 26, 2024
app pub date -
Jun 26, 2023
filing date -
Jun 26, 2023
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Abstract
Methods for etching metal, such as for processing a metal gate, are provided. A method includes forming a hard mask over the metal, wherein the hard mask includes a sidewall defining an opening; and performing a plasma etching process including cycles of depositing a carbon nitride film on the sidewall and etching the metal.
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