RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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United States of America
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Issued Date -
Dec 26, 2024
app pub date -
Jun 5, 2024
filing date -
Jun 5, 2024
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Abstract
A resist topcoat composition and a method of forming (or providing) patterns utilizing the resist topcoat composition are provided. The resist topcoat composition includes a copolymer including a first structural unit represented by Chemical Formula M-1, a second structural unit represented by Chemical Formula M-2, and a third structural unit represented by Chemical Formula M-3A or Chemical Formula M-3B; and a solvent. Details about the above chemical formulas are as described in the specification.
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