PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

United States of America

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Dec 26, 2024
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Aug 30, 2024
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Aug 30, 2024

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Abstract

The present invention relates to a photosensitive resin that has high solubility in and good etching resistance to a developer even under sub-248 nm and 193 nm short-wavelength exposure sources and forms a low line edge roughness. The present invention also relates to a photoresist composition including the photosensitive resin.

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Patent Owner	Address
TAKOMA TECHNOLOGY CO LTD	1168 NONSANPYEONGYA-RO NOSEONG-MYEON CHUNGCHEONGNAM-DO NONSAN-SI 32903

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Inventor Name	Address	# of filed Patents	Total Citations
Park, Jin Kyu	Sejong-si, KR	38	228
Ryu, Mi Sun	Daejeon, KR	4	9

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PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America

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