ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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United States of America
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Dec 26, 2024
app pub date -
Sep 6, 2024
filing date -
Sep 6, 2024
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Abstract
It is an object of the present invention to provide an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern with high LWR performance, a resist film, a pattern forming method, a method for producing an electronic device, and an electronic device. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin that includes a repeating unit represented by a formula (Ia) and a repeating unit represented by a formula (IIa) and has a main chain that is cleaved by exposure, and an ionic compound represented by a formula (III), and the resin satisfies a requirement 1 and a requirement 2.
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