MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK
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United States of America
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Issued Date -
Dec 26, 2024
app pub date -
Jun 5, 2024
filing date -
Jun 5, 2024
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Abstract
A method of manufacturing a photomask comprises forming a mask film on a surface of a substrate, and forming, with the mask film, a first mask pattern in a first region of the substrate and a second mask pattern in a second region of the substrate. A coverage ratio of the first mask pattern is different from a coverage ratio of the second mask pattern. A light transmittance rate of light through the substrate in the first region and the first mask pattern is different from a light transmittance rate of the light through the substrate in the second region and the second mask pattern.
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