PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK
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United States of America
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Issued Date -
Dec 26, 2024
app pub date -
Jun 12, 2024
filing date -
Jun 12, 2024
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Abstract
A photomask blank includes a substrate, a first transmittance adjusting film provided on the substrate, a phase shifter film provided on the first transmittance adjusting film, and a second transmittance adjusting film provided on the phase shifter film. When light having a wavelength transmits through the phase shifter film, a phase of the light transmitted through the phase shifter film and the first transmittance adjusting film is different from a phase of light passed through atmosphere with about 180 degrees, and a phase of the light transmitted through the phase shifter film and the second transmittance adjusting film is different from a phase of the light passed through the atmosphere with about 180 degrees.
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