SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240422982A1
SERIAL NO

18740858

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Abstract

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A semiconductor device according to the present embodiment includes a first insulator, a conductive layer, and a film. The film is provided between the first insulator and the conductive layer and contains carbon (C) or silicon (Si). The semiconductor device further comprises a stacked body in which insulating layers and the conductive layers are alternately stacked in a first direction, a semiconductor layer disposed in the first direction in the stacked body, a second insulator disposed in the first direction between the stacked body and the semiconductor layer, a third insulator disposed in the first direction between the stacked body and the second insulator, and a fourth insulator disposed in the first direction between the stacked body and the third insulator. The first insulator is disposed between the conductive layers and the insulating layers and between the conductive layers and the fourth insulator.

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Patent Owner(s)

Patent OwnerAddress
KIOXIA CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KITAGAWA, Daisuke Yokkaichi Mie, JP 21 79
TAKAHASHI, Kensei Kuwana Mie, JP 13 20

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