DOPED POLAR LAYERS AND SEMICONDUCTOR DEVICE INCORPORATING SAME

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240421229A1
SERIAL NO

18619772

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The disclosed technology generally relates to ferroelectric materials and semiconductor devices, and more particularly to semiconductor memory devices incorporating doped polar materials. In one aspect, a semiconductor device comprises a capacitor which in turn comprises a polar layer comprising a base polar material doped with a dopant. The base polar material includes one or more metal elements and one or both of oxygen or nitrogen. The dopant comprises a metal element that is different from the one or more metal elements and is present at a concentration such that a ferroelectric switching voltage of the capacitor is different from that of the capacitor having the base polar material without being doped with the dopant by more than about 100 mV. The capacitor stack additionally comprises first and second crystalline conductive oxide electrodes on opposing sides of the polar layer. The capacitor stack further comprises first and second barrier metal layers on respective ones of the first and second crystalline conductive oxide electrodes on opposing sides of the polar layer.

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Patent Owner(s)

Patent OwnerAddress
KEPLER COMPUTING INCSAN FRANCISCO CA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Manipatruni, Sasikanth Portland, US 400 3194
Ramamoorthy, Ramesh Moraga, US 23 297
Thareja, Gaurav Santa Clara, US 75 903

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