SUBSTRATE PROCESSING APPARATUS
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United States of America
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Issued Date -
Dec 19, 2024
app pub date -
Jan 17, 2024
filing date -
Jan 17, 2024
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Abstract
A substrate processing apparatus according to an embodiment includes: a chamber providing a processing space; a support member disposed in the processing space and configured to support a substrate during a process treatment; an antenna providing energy for plasma excitation into the processing space; and an inner electromagnet disposed outside the processing space.
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