ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY
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United States of America
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Issued Date -
Dec 19, 2024
app pub date -
Aug 27, 2024
filing date -
Aug 27, 2024
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Abstract
A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.
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