PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

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United States of America

APP PUB NO 20240417648A1
SERIAL NO

18680569

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Abstract

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A processing solution for a semiconductor device including a fluorine-containing compound, water, a cyclic ether compound, and a water-soluble organic solvent that is not the cyclic ether compound; a method for processing a substrate; and a method for manufacturing a semiconductor device.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTDKANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kimura, Kenta Kawasaki-shi, JP 47 84

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