Interlayer of Sub-structure Having Elevations and Further Sub-structure with Filler Particles in Recesses Between the Elevations

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240413033A1
SERIAL NO

18810035

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Abstract

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A method includes coupling a first sub-structure with a second sub-structure; configuring the second sub-structure as a composite comprising filler particles in a matrix; configuring a surface of the first sub-structure with a surface profile having first elevations and first recesses; at least partially inserting at least part of the filler particles in the first recesses to form an interlayer comprising the first elevations of the first sub-structure and filler particles in the matrix of the second sub-structure; and forming second elevations and second recesses on the first elevations and the first recesses, wherein the second elevations and the second recesses have smaller dimensions than the first elevations and the first recesses, wherein the second recesses are dimensioned to enable at least part of the matrix to at least partially enter the second recesses and are dimensioned to disable the filler particles to enter the second recesses.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES AGAM CAMPEON 1-15 NEUBIBERG 85579

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Riedl, Edmund Wald, DE 37 196
Schwab, Stefan Singapore, MY 35 162

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