APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTOR PROCESSING
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United States of America
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Issued Date -
Dec 12, 2024
app pub date -
Oct 7, 2022
filing date -
Oct 7, 2022
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Abstract
Disclosed herein are systems and apparatuses for facilitating semiconductor processing operations involving the use of chlorine-containing and ammonia-containing gases. The systems and apparatuses discussed herein may provide enhanced wafer uniformity and/or may reduce the potential for undesirable, and potentially hazardous, reaction byproduct build-up in such systems.
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