PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERN
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United States of America
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N/A
Issued Date -
Dec 12, 2024
app pub date -
Jul 3, 2023
filing date -
Jul 3, 2023
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A photomask set including a first photomask and a second photomask is provided. The first photomask includes a first pattern. The first pattern includes a first main portion and a first stitching portion connected to each other. The first stitching portion includes a first matching portion and a first overlapping portion connected to each other. The second photomask includes a second pattern. The second pattern includes a second main portion and a second stitching portion connected to each other. The second stitching portion includes a second matching portion and a second overlapping portion connected to each other. After the first photomask is aligned with the second photomask, the first matching portion matches the second matching portion, the first overlapping portion overlaps the second pattern, and the second overlapping portion overlaps the first pattern.
First Claim
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International Classification(s)
Cited Art Landscape
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- G03F Class
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