MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

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Dec 12, 2024
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Oct 26, 2022
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Oct 26, 2022

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Abstract

[Problem] To obtain a substrate with a multilayer reflective film capable of suppressing a decrease in reflectance of a multilayer reflective film with respect to EUV light for the substrate with a multilayer reflective film having a structure in which a protective film containing metal is disposed.

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Patent Owner(s)

Patent Owner	Address
HOYA CORPORATION	6-10-1 NISHI-SHINJUKU SHINJUKU-KU TOKYO 160-8347

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Inventor Name	Address	# of filed Patents	Total Citations
KISHIDA, Hibiki	Tokyo, JP	1	0
NAKAGAWA, Masanori	Tokyo, JP	50	420
SUZUKI, Kota	Tokyo, JP	48	580

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MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

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18701869

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