REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
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United States of America
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Issued Date -
Dec 12, 2024
app pub date -
May 28, 2024
filing date -
May 28, 2024
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Abstract
A reflective photomask blank has a substrate 1; a multilayer reflective film 2 formed on the substrate and reflecting exposure light that is extreme ultraviolet region light; a protective film 3 formed on the multilayer reflective film 2 and protecting the multilayer reflective film 2; a light absorbing film 4 formed on the protective film and absorbing the exposure light; and a hard mask film provided on the light absorbing film 4. The light absorbing film 4 includes a multilayer including an absorbing layer 42 and an oxide layer 41 containing oxygen. The hard mask film includes a second layer 52, 53 or a multilayer film including a second layer 52, 53 and a first layer 51. The second layer 52, 53 includes a multilayer including an upper hard mask layer 52 and a lower hard mask layer 53 containing oxygen.
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