METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GENERATION FROM A DIFFRACTIVE STRUCTURE
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United States of America
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Dec 12, 2024
app pub date -
Oct 10, 2022
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Oct 10, 2022
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Abstract
Disclosed is metrology apparatus for measurement of a diffractive structure on a substrate. comprising: a radiation source operable to provide first radiation for excitation of the diffractive structure, said first radiation having a first wavelength; a detection arrangement operable to detect at least diffracted second radiation comprising a second harmonic of said first radiation, said diffracted second radiation being generated from said diffractive structure and/or substrate and diffracted by said diffractive structure; and a processing arrangement operable to determine a parameter of interest relating to said diffractive structure from at least said diffracted second radiation.
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