FLOW RATE CONTROL DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240410490A1
SERIAL NO

18386779

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a flow rate control device capable of suppressing variation of supply pressure caused by variation of set flow rate and suppressing influence of pressure loss and cavitation on a secondary side. The flow rate control device (18) includes: a flow rate regulating valve (19) that regulates a flow rate of fluid flowing in a flow path; a flow meter (20) that measures the flow rate of the fluid flowing in the flow path; and a control portion (21) that controls an opening degree of the flow rate regulating valve (19) based on a measurement result of the flow meter (20), the flow rate regulating valve (19) is a three-way valve for dividing to regulate fluid flowing in from an inflow port (24) to a first outflow port (25) and a second outflow port (26), the flow meter (20) is connected to the second outflow port (26) side, and a multistage throttle orifice (22) for decompressing the pressure of the fluid in stages is provided on the first outflow port (25) side.

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Patent Owner(s)

Patent OwnerAddress
TOFLO CORPORATIONHINO-SHI TOKYO 191-0041

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AMANO, Hiroyoshi Tokyo, JP 2 4
BABA, Taichi Tokyo, JP 1 0
CHINO, Kurumi Tokyo, JP 1 0
KAWAMOTO, Takahiro Tokyo, JP 56 147

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