CHAMBER FOR GAS LASER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD
Number of patents in Portfolio can not be more than 2000
United States of America
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N/A
Issued Date -
Dec 5, 2024
app pub date -
Aug 9, 2024
filing date -
Aug 9, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A chamber for a gas laser device includes a first main electrode and a second main electrode arranged along a predetermined direction as being apart from and facing each other in the internal space, a window arranged at a wall surface of the chamber and transmitting light from the internal space, and a first preionization electrode arranged beside one side of the first main electrode. Here, the first preionization electrode includes a first dielectric pipe, a first preionization inner electrode arranged in the first dielectric pipe and extending along the first dielectric pipe, and a first preionization outer electrode extending along the first dielectric pipe and including a first end portion facing the first dielectric pipe with a first gap with respect to the first dielectric pipe. At least a part of the first gap is larger than 0 mm and equal to or smaller than 0.9 mm.
First Claim
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