SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF SIGNALS PROVIDED TO ELECTRODES
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Dec 5, 2024
app pub date -
Sep 16, 2022
filing date -
Sep 16, 2022
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A method for increasing a rate of processing a substrate to achieve an etch profile of the substrate is described. The method includes receiving a parameter signal from a first sensor when a first radio frequency (RF) signal is provided to a substrate support and a second RF signal is provided to an upper electrode. The method further includes determining, based on the parameter signal, a first time at which a value of a parameter is maximum. The method also includes receiving a variable signal from a second sensor. The method includes determining, based on the variable signal, a second time at which a first amount of flux of secondary electrons from the upper electrode to the substrate support is maximum. The method includes determining a phase difference to be a difference between the first time and the second time and achieving the phase difference.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully